1 Scope of the Report
1.1 Market Introduction
1.2 Years Considered
1.3 Research Objectives
1.4 Market Research Methodology
1.5 Research Process and Data Source
1.6 Economic Indicators
1.7 Currency Considered
1.8 Market Estimation Caveats
2 Executive Summary
2.1 World Market Overview
2.1.1 Global Inductively Coupled Plasma (ICP) Etchers Annual Sales 2018-2029
2.1.2 World Current & Future Analysis for Inductively Coupled Plasma (ICP) Etchers by Geographic Region, 2018, 2022 & 2029
2.1.3 World Current & Future Analysis for Inductively Coupled Plasma (ICP) Etchers by Country/Region, 2018, 2022 & 2029
2.2 Inductively Coupled Plasma (ICP) Etchers Segment by Type
2.2.1 Planar ICP Source
2.2.2 Cylindrical ICP Source
2.3 Inductively Coupled Plasma (ICP) Etchers Sales by Type
2.3.1 Global Inductively Coupled Plasma (ICP) Etchers Sales Market Share by Type (2018-2023)
2.3.2 Global Inductively Coupled Plasma (ICP) Etchers Revenue and Market Share by Type (2018-2023)
2.3.3 Global Inductively Coupled Plasma (ICP) Etchers Sale Price by Type (2018-2023)
2.4 Inductively Coupled Plasma (ICP) Etchers Segment by Application
2.4.1 Semiconductors
2.4.2 Dielectrics
2.4.3 Metals
2.4.4 Polymers
2.5 Inductively Coupled Plasma (ICP) Etchers Sales by Application
2.5.1 Global Inductively Coupled Plasma (ICP) Etchers Sale Market Share by Application (2018-2023)
2.5.2 Global Inductively Coupled Plasma (ICP) Etchers Revenue and Market Share by Application (2018-2023)
2.5.3 Global Inductively Coupled Plasma (ICP) Etchers Sale Price by Application (2018-2023)
3 Global Inductively Coupled Plasma (ICP) Etchers by Company
3.1 Global Inductively Coupled Plasma (ICP) Etchers Breakdown Data by Company
3.1.1 Global Inductively Coupled Plasma (ICP) Etchers Annual Sales by Company (2018-2023)
3.1.2 Global Inductively Coupled Plasma (ICP) Etchers Sales Market Share by Company (2018-2023)
3.2 Global Inductively Coupled Plasma (ICP) Etchers Annual Revenue by Company (2018-2023)
3.2.1 Global Inductively Coupled Plasma (ICP) Etchers Revenue by Company (2018-2023)
3.2.2 Global Inductively Coupled Plasma (ICP) Etchers Revenue Market Share by Company (2018-2023)
3.3 Global Inductively Coupled Plasma (ICP) Etchers Sale Price by Company
3.4 Key Manufacturers Inductively Coupled Plasma (ICP) Etchers Producing Area Distribution, Sales Area, Product Type
3.4.1 Key Manufacturers Inductively Coupled Plasma (ICP) Etchers Product Location Distribution
3.4.2 Players Inductively Coupled Plasma (ICP) Etchers Products Offered
3.5 Market Concentration Rate Analysis
3.5.1 Competition Landscape Analysis
3.5.2 Concentration Ratio (CR3, CR5 and CR10) & (2018-2023)
3.6 New Products and Potential Entrants
3.7 Mergers & Acquisitions, Expansion
4 World Historic Review for Inductively Coupled Plasma (ICP) Etchers by Geographic Region
4.1 World Historic Inductively Coupled Plasma (ICP) Etchers Market Size by Geographic Region (2018-2023)
4.1.1 Global Inductively Coupled Plasma (ICP) Etchers Annual Sales by Geographic Region (2018-2023)
4.1.2 Global Inductively Coupled Plasma (ICP) Etchers Annual Revenue by Geographic Region (2018-2023)
4.2 World Historic Inductively Coupled Plasma (ICP) Etchers Market Size by Country/Region (2018-2023)
4.2.1 Global Inductively Coupled Plasma (ICP) Etchers Annual Sales by Country/Region (2018-2023)
4.2.2 Global Inductively Coupled Plasma (ICP) Etchers Annual Revenue by Country/Region (2018-2023)
4.3 Americas Inductively Coupled Plasma (ICP) Etchers Sales Growth
4.4 APAC Inductively Coupled Plasma (ICP) Etchers Sales Growth
4.5 Europe Inductively Coupled Plasma (ICP) Etchers Sales Growth
4.6 Middle East & Africa Inductively Coupled Plasma (ICP) Etchers Sales Growth
5 Americas
5.1 Americas Inductively Coupled Plasma (ICP) Etchers Sales by Country
5.1.1 Americas Inductively Coupled Plasma (ICP) Etchers Sales by Country (2018-2023)
5.1.2 Americas Inductively Coupled Plasma (ICP) Etchers Revenue by Country (2018-2023)
5.2 Americas Inductively Coupled Plasma (ICP) Etchers Sales by Type
5.3 Americas Inductively Coupled Plasma (ICP) Etchers Sales by Application
5.4 United States
5.5 Canada
5.6 Mexico
5.7 Brazil
6 APAC
6.1 APAC Inductively Coupled Plasma (ICP) Etchers Sales by Region
6.1.1 APAC Inductively Coupled Plasma (ICP) Etchers Sales by Region (2018-2023)
6.1.2 APAC Inductively Coupled Plasma (ICP) Etchers Revenue by Region (2018-2023)
6.2 APAC Inductively Coupled Plasma (ICP) Etchers Sales by Type
6.3 APAC Inductively Coupled Plasma (ICP) Etchers Sales by Application
6.4 China
6.5 Japan
6.6 South Korea
6.7 Southeast Asia
6.8 India
6.9 Australia
6.10 China Taiwan
7 Europe
7.1 Europe Inductively Coupled Plasma (ICP) Etchers by Country
7.1.1 Europe Inductively Coupled Plasma (ICP) Etchers Sales by Country (2018-2023)
7.1.2 Europe Inductively Coupled Plasma (ICP) Etchers Revenue by Country (2018-2023)
7.2 Europe Inductively Coupled Plasma (ICP) Etchers Sales by Type
7.3 Europe Inductively Coupled Plasma (ICP) Etchers Sales by Application
7.4 Germany
7.5 France
7.6 UK
7.7 Italy
7.8 Russia
8 Middle East & Africa
8.1 Middle East & Africa Inductively Coupled Plasma (ICP) Etchers by Country
8.1.1 Middle East & Africa Inductively Coupled Plasma (ICP) Etchers Sales by Country (2018-2023)
8.1.2 Middle East & Africa Inductively Coupled Plasma (ICP) Etchers Revenue by Country (2018-2023)
8.2 Middle East & Africa Inductively Coupled Plasma (ICP) Etchers Sales by Type
8.3 Middle East & Africa Inductively Coupled Plasma (ICP) Etchers Sales by Application
8.4 Egypt
8.5 South Africa
8.6 Israel
8.7 Turkey
8.8 GCC Countries
9 Market Drivers, Challenges and Trends
9.1 Market Drivers & Growth Opportunities
9.2 Market Challenges & Risks
9.3 Industry Trends
10 Manufacturing Cost Structure Analysis
10.1 Raw Material and Suppliers
10.2 Manufacturing Cost Structure Analysis of Inductively Coupled Plasma (ICP) Etchers
10.3 Manufacturing Process Analysis of Inductively Coupled Plasma (ICP) Etchers
10.4 Industry Chain Structure of Inductively Coupled Plasma (ICP) Etchers
11 Marketing, Distributors and Customer
11.1 Sales Channel
11.1.1 Direct Channels
11.1.2 Indirect Channels
11.2 Inductively Coupled Plasma (ICP) Etchers Distributors
11.3 Inductively Coupled Plasma (ICP) Etchers Customer
12 World Forecast Review for Inductively Coupled Plasma (ICP) Etchers by Geographic Region
12.1 Global Inductively Coupled Plasma (ICP) Etchers Market Size Forecast by Region
12.1.1 Global Inductively Coupled Plasma (ICP) Etchers Forecast by Region (2024-2029)
12.1.2 Global Inductively Coupled Plasma (ICP) Etchers Annual Revenue Forecast by Region (2024-2029)
12.2 Americas Forecast by Country
12.3 APAC Forecast by Region
12.4 Europe Forecast by Country
12.5 Middle East & Africa Forecast by Country
12.6 Global Inductively Coupled Plasma (ICP) Etchers Forecast by Type
12.7 Global Inductively Coupled Plasma (ICP) Etchers Forecast by Application
13 Key Players Analysis
13.1 Lam Research
13.1.1 Lam Research Company Information
13.1.2 Lam Research Inductively Coupled Plasma (ICP) Etchers Product Portfolios and Specifications
13.1.3 Lam Research Inductively Coupled Plasma (ICP) Etchers Sales, Revenue, Price and Gross Margin (2018-2023)
13.1.4 Lam Research Main Business Overview
13.1.5 Lam Research Latest Developments
13.2 TEL
13.2.1 TEL Company Information
13.2.2 TEL Inductively Coupled Plasma (ICP) Etchers Product Portfolios and Specifications
13.2.3 TEL Inductively Coupled Plasma (ICP) Etchers Sales, Revenue, Price and Gross Margin (2018-2023)
13.2.4 TEL Main Business Overview
13.2.5 TEL Latest Developments
13.3 Applied Materials
13.3.1 Applied Materials Company Information
13.3.2 Applied Materials Inductively Coupled Plasma (ICP) Etchers Product Portfolios and Specifications
13.3.3 Applied Materials Inductively Coupled Plasma (ICP) Etchers Sales, Revenue, Price and Gross Margin (2018-2023)
13.3.4 Applied Materials Main Business Overview
13.3.5 Applied Materials Latest Developments
13.4 Hitachi High-Tech
13.4.1 Hitachi High-Tech Company Information
13.4.2 Hitachi High-Tech Inductively Coupled Plasma (ICP) Etchers Product Portfolios and Specifications
13.4.3 Hitachi High-Tech Inductively Coupled Plasma (ICP) Etchers Sales, Revenue, Price and Gross Margin (2018-2023)
13.4.4 Hitachi High-Tech Main Business Overview
13.4.5 Hitachi High-Tech Latest Developments
13.5 Oxford Instruments
13.5.1 Oxford Instruments Company Information
13.5.2 Oxford Instruments Inductively Coupled Plasma (ICP) Etchers Product Portfolios and Specifications
13.5.3 Oxford Instruments Inductively Coupled Plasma (ICP) Etchers Sales, Revenue, Price and Gross Margin (2018-2023)
13.5.4 Oxford Instruments Main Business Overview
13.5.5 Oxford Instruments Latest Developments
13.6 SPTS Technologies
13.6.1 SPTS Technologies Company Information
13.6.2 SPTS Technologies Inductively Coupled Plasma (ICP) Etchers Product Portfolios and Specifications
13.6.3 SPTS Technologies Inductively Coupled Plasma (ICP) Etchers Sales, Revenue, Price and Gross Margin (2018-2023)
13.6.4 SPTS Technologies Main Business Overview
13.6.5 SPTS Technologies Latest Developments
13.7 Plasma-Therm
13.7.1 Plasma-Therm Company Information
13.7.2 Plasma-Therm Inductively Coupled Plasma (ICP) Etchers Product Portfolios and Specifications
13.7.3 Plasma-Therm Inductively Coupled Plasma (ICP) Etchers Sales, Revenue, Price and Gross Margin (2018-2023)
13.7.4 Plasma-Therm Main Business Overview
13.7.5 Plasma-Therm Latest Developments
13.8 GigaLane
13.8.1 GigaLane Company Information
13.8.2 GigaLane Inductively Coupled Plasma (ICP) Etchers Product Portfolios and Specifications
13.8.3 GigaLane Inductively Coupled Plasma (ICP) Etchers Sales, Revenue, Price and Gross Margin (2018-2023)
13.8.4 GigaLane Main Business Overview
13.8.5 GigaLane Latest Developments
13.9 SAMCO
13.9.1 SAMCO Company Information
13.9.2 SAMCO Inductively Coupled Plasma (ICP) Etchers Product Portfolios and Specifications
13.9.3 SAMCO Inductively Coupled Plasma (ICP) Etchers Sales, Revenue, Price and Gross Margin (2018-2023)
13.9.4 SAMCO Main Business Overview
13.9.5 SAMCO Latest Developments
13.10 Corial
13.10.1 Corial Company Information
13.10.2 Corial Inductively Coupled Plasma (ICP) Etchers Product Portfolios and Specifications
13.10.3 Corial Inductively Coupled Plasma (ICP) Etchers Sales, Revenue, Price and Gross Margin (2018-2023)
13.10.4 Corial Main Business Overview
13.10.5 Corial Latest Developments
13.11 AMEC
13.11.1 AMEC Company Information
13.11.2 AMEC Inductively Coupled Plasma (ICP) Etchers Product Portfolios and Specifications
13.11.3 AMEC Inductively Coupled Plasma (ICP) Etchers Sales, Revenue, Price and Gross Margin (2018-2023)
13.11.4 AMEC Main Business Overview
13.11.5 AMEC Latest Developments
13.12 NAURA
13.12.1 NAURA Company Information
13.12.2 NAURA Inductively Coupled Plasma (ICP) Etchers Product Portfolios and Specifications
13.12.3 NAURA Inductively Coupled Plasma (ICP) Etchers Sales, Revenue, Price and Gross Margin (2018-2023)
13.12.4 NAURA Main Business Overview
13.12.5 NAURA Latest Developments
14 Research Findings and Conclusion
※参考情報 誘導結合プラズマ(ICP)エッチャーは、半導体製造や材料科学の分野で広く使用される先進的なエッチング技術です。この技術は主に、半導体デバイスの微細加工や表面処理に利用され、非常に制御されたエッチングプロセスを実現します。以下に、ICPエッチャーの概念、特徴、種類、用途、関連技術について詳述します。 ICPエッチャーは、誘導結合プラズマを利用して材料を選択的にエッチングする装置です。プラズマとは、気体中の原子が高エネルギー状態になったイオン化された状態を指し、通常の気体状態と異なり電気的に中性で、高い反応性を持っています。ICPエッチャーでは、高周波数の電磁波をコイルで発生させ、その電磁波がガスを励起し、プラズマを生成します。このプラズマが基板表面の材料を反応させ、選択的にエッチングを行います。 ICPエッチャーの特徴の一つは、その高度なエッチング精度です。誘導結合プラズマは、エッチング時のイオン密度とエネルギーを高く維持することが可能であり、これにより微細なパターンの形成が可能になります。同時に、基板の温度管理も重要であり、通常は冷却システムを使用して基板温度が過度に上昇しないように管理されます。 ICPエッチャーは、主に二つの異なる種類に分類されます。一つは、Open ICP(オープンICP)であり、これはエッチングガスが基板に直接供給され、プラズマの生成が行われる方式です。この方式は、比較的大きな部品を処理するのに適しています。もう一つは、Closed ICP(クローズドICP)で、こちらは真空チャンバー内でガスが循環する方式です。この場合、エッチングプロセスの安定性が高まり、均一なエッチングが期待できます。 ICPエッチャーの用途は多岐にわたりますが、特に半導体製造プロセスにおいて重要な役割を果たします。例えば、シリコンウェハ上に形成された絶縁膜や金属膜の加工や、微細なパターンを形成するためのエッチングが挙げられます。このプロセスは、半導体デバイスの製造において、トランジスタや配線パターンの形成に不可欠です。さらに、光学素子やMEMS(Micro-Electro-Mechanical Systems)デバイスの製造においても、ICPエッチャーは重要な役割を果たします。 関連技術としては、化学的エッチング(Wet Etching)やプラズマエッチング(RIE: Reactive Ion Etching)と比較されることが多いです。化学的エッチングでは、液体のエッチング剤を使用して材料を除去しますが、選択性や精度の面で制約があることが多いです。一方、プラズマエッチングは、イオン源としてのプラズマを利用しますが、ICPエッチャーはその中でも高いエネルギー効率と制御性を持つため、特に細かいパターン形成に適しています。 ICPエッチャーのトレンドとして、ますます微細化が進む半導体デバイスに対応するため、高精度・高選択性のエッチング技術が求められています。また、環境配慮から、より低い温度や圧力での動作が可能な新しいプラズマ技術の開発が進められています。これにより、将来的な半導体製造の効率化が期待されています。 最後に、ICPエッチャーは単体で使用されるだけでなく、他の製造プロセスや設備と連携して使用されることが一般的です。たとえば、リソグラフィー技術や蒸着技術と組み合わせることで、より複雑な多層構造の形成が可能となります。したがって、ICPエッチャーは、現代のナノテクノロジーや半導体製造において、ますます重要な役割を果たす技術であると言えます。 |
*** 免責事項 ***
https://www.globalresearch.co.jp/disclaimer/